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1

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 1.37 MB

english, 1998

2

Fact vs Fallacy: The Anti-Vaccine Discussion Reloaded

Stolle, Lucas B., Nalamasu, Rohit, Pergolizzi, Joseph V., Varrassi, Giustino, Magnusson, Peter, LeQuang, JoAnn, Breve, Frank

Journal:

Advances in Therapy

Year:

2020

File:

PDF, 320 KB

2020

3

Preparation of Biopolymer Fibers by Electrospinning from Room Temperature Ionic Liquids

Viswanathan, Gunaranjan, Murugesan, Saravanababu, Pushparaj, Victor, Nalamasu, Omkaram, Ajayan, Pulickel M., Linhardt, Robert J.

Journal:

Biomacromolecules

Year:

2006

Language:

english

File:

PDF, 191 KB

english, 2006

4

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Characterization of the development of DNQ/novolac resists by surface energy measurements

Fadda, Emilienne, Amblard, Gilles R., Weill, Andre P., Prola, Alain, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 336 KB

english, 1994

5

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Development of a chemically amplified positive resist material for single-layer deep-UV lithography

Nalamasu, Omkaram, Cheng, May, Kometani, Janet M., Vaidya, Sheila, Reichmanis, Elsa, Thompson, Larry F., Watts, Michael P. C.

Year:

1990

Language:

english

File:

PDF, 1.06 MB

english, 1990

6

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Preliminary lithographic characteristics of an all-organic chemically amplified resist formulation for single-layer deep-UV lithography

Nalamasu, Omkaram, Reichmanis, Elsa, Cheng, May, Pol, Victor, Kometani, Janet M., Houlihan, Francis M., Neenan, Thomas X., Bohrer, M. P., Mixon, David A., Thompson, Larry F., Takemoto, Clifford H., It

Year:

1991

Language:

english

File:

PDF, 1.18 MB

english, 1991

7

SPIE Proceedings [SPIE SPIE'S 1993 Symposium on Microlithography - San Jose, CA (Sunday 28 February 1993)] Advances in Resist Technology and Processing X - Positive chemically amplified resist for deep-UV lithography

Nalamasu, Omkaram, Timko, Allen G., Cheng, May, Kometani, Janet M., Galvin-Donoghue, Mary E., Heffner, Sharon A., Slater, Sydney G., Blakeney, Andrew J., Muenzel, Norbert, Schulz, Reinhard, Holzwarth,

Year:

1993

Language:

english

File:

PDF, 990 KB

english, 1993

8

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || The Influence of Structure on Dissolution Inhibition for Novolac-Based Photoresists: Adaption of the Probabilistic Approach

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 1.15 MB

english, 1998

9

A unified approach to resists materials design for the advanced lithographic technologies

O. Nalamasu, E. Reichmanis, A.G. Timko, R. Tarascon, A.E. Novembre, S. Slater, H. Holzwarth, P. Falcigno, N. Mu¨nzel

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 548 KB

english, 1995

10

Synthesis of carbon–silica shell-core hybrid structures and carbon nanoshells by a template method

P. Victor, A. Kumar, F. Lupo, D. Gandhi, S. Agrawal, G. Ramanath, O. Nalamasu

Journal:

Year:

2006

Language:

english

File:

PDF, 283 KB

english, 2006

11

A 2 million transistor digital processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology

G.P. Watson, I.C. Kizilyalli, M. Miller, Y.T. Wang, B. Pati, R.A. Cirelli, O. Nalamasu, J. Radosevich, R. Kohler, R. Freyman, F. Baumann, F. Klemens, W. Mansfield, H. Vaidya, J. Frackoviak, A. Timko,

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 770 KB

english, 2000

12

Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography

R.A. Cirelli, J. Bude, F. Houlihan, A. Gabor, G.P. Watson, G.R. Weber, F.P. Klemens, J. Sweeney, W.M. Mansfield, O. Nalamasu

Journal:

Microelectronic Engineering

Year:

2000

Language:

english

File:

PDF, 721 KB

english, 2000

13

Effect of post-exposure delay in positive acting chemically amplified resists: An analytical study

O. Nalamasu, E. Reichmanis, J. E. Hanson, R. S. Kanga, L. A. Heimbrook, A. B. Emerson, F. A. Baiocchi, S. Vaidya

Journal:

Polymer Engineering & Science

Year:

1992

Language:

english

File:

PDF, 600 KB

english, 1992

14

Direct growth of aligned carbon nanotubes on bulk metals:

Talapatra, S., Kar, S., Pal, S. K., Vajtai, R., Ci, L., Victor, P., Shaijumon, M. M., Kaur, S., Nalamasu, O., Ajayan, P. M.

Journal:

Nature Nanotechnology

Year:

2006

Language:

english

File:

PDF, 617 KB

english, 2006

15

Fatigue resistance of aligned carbon nanotube arrays under cyclic compression

Suhr, J., Victor, P., Ci, L., Sreekala, S., Zhang, X., Nalamasu, O., Ajayan, P. M.

Journal:

Nature Nanotechnology

Year:

2007

Language:

english

File:

PDF, 290 KB

english, 2007

16

Chemically amplified resists: Chemistry and processes

E. Reichmanis, F. M. Houlihan, O. Nalamasu, T. X. Neenan

Journal:

Advanced Functional Materials

Year:

1994

Language:

english

File:

PDF, 845 KB

english, 1994

17

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Modeling of solvent evaporation effects for hot plate baking of photoresist

Mack, Chris A., DeWitt, David P., Tsai, Benjamin K., Yetter, Gil, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 281 KB

english, 1994

18

Chemical amplification mechanisms for microlithography

Reichmanis, E., Houlihan, F. M., Nalamasu, O., Neenan, T. X.

Journal:

Chemistry of Materials

Year:

1991

Language:

english

File:

PDF, 3.80 MB

english, 1991

19

Organic Materials Challenges for 193 nm Imaging

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Frank M.

Journal:

Accounts of Chemical Research

Year:

1999

Language:

english

File:

PDF, 227 KB

english, 1999

20

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Post-Exposure Bake Kinetics in Epoxy Novolac-Based Chemically Amplified Resists

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 940 KB

english, 1998

21

Low-cost, low-loss microlens arrays fabricated by soft-lithography replication process

Kunnavakkam, Madanagopal V., Houlihan, F. M., Schlax, M., Liddle, J. A., Kolodner, P., Nalamasu, O., Rogers, J. A.

Journal:

Applied Physics Letters

Year:

2003

Language:

english

File:

PDF, 356 KB

english, 2003

22

Characteristics of an improved chemically amplified deep-ultraviolet positive resist

Nalamasu, Omkaram

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1992

Language:

english

File:

PDF, 991 KB

english, 1992

23

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Diffusion effects in chemically amplified deep-UV resists

Zuniga, Marco A., Tomacruz, Eric, Neureuther, Andrew R., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 342 KB

english, 1994

24

193 nm single layer resist strategies, concepts, and recent results

Year:

1998

Language:

english

File:

PDF, 3.10 MB

english, 1998

25

Environmental stability of 193 nm single layer chemically amplified resists

A. G. Timko, F. M. Houlihan, R. A. Cirelli, O. Nalamasu, H. Yoshino, T. Itani, H. Tanabe, K. Kasama

Year:

1999

Language:

english

File:

PDF, 1.88 MB

english, 1999

26

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Calixarene and Dendrimer as Novel Photoresist Materials

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 878 KB

english, 1998

27

Lithographic Materials Technologies: 193 nm Imaging and Beyond

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M., Gabor, Allen H., Neisser, Mark O., Bowden, Murrae J.

Journal:

MRS Proceedings

Year:

1999

Language:

english

File:

PDF, 871 KB

english, 1999

28

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Modeling chemically amplified resists for 193-nm lithography

Croffie, Ebo H., Cheng, Mosong, Neureuther, Andrew R., Houlihan, Francis M., Cirelli, Raymond A., Sweeney, James R., Dabbagh, Gary, Watson, Pat G., Nalamasu, Omkaram, Rushkin, Ilya L., Dimov, Ognian N

Year:

2000

Language:

english

File:

PDF, 916 KB

english, 2000

29

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Role of process in obtaining optimum lithographic information from chemically amplified resists

Szmanda, Charles R., Fedynyshyn, Theodore H., Houck, William E., Root, Jonathan C., Blacksmith, Robert F., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 479 KB

english, 1994

30

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Synthesis, characterization, and lithography of α-substituted 2-nitrobenzyl arylsulfonate photo-acid generators with improved resistance to post-exposure bake

Houlihan, Francis M., Chin, Evelyn, Nalamasu, Omkaram, Kometani, Janet M., Neenan, Thomas X., Pangborne, A., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 599 KB

english, 1994

31

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Investigation of onium salt type photoacid generators in positive DUV resist systems

Cronin, Michael F., Adams, Timothy G., Fedynyshyn, Theodore H., Georger, Jr., Jacque H., Mori, J. Michael, Sinta, Roger F., Thackeray, James W., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 332 KB

english, 1994

32

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Comparison of the lithographic characteristics of t-BOC-based chemically amplified resist system under deep-UV and electron-beam exposures

Tarascon-Auriol, Regine G., Novembre, Anthony E., Tai, Woon W., Fetter, Linus A., Kometani, Janet M., Nalamasu, Omkaram, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 832 KB

english, 1994

33

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Molecular bases for the interaction between novolaks and diazonaphthoquinone photoactive compounds

Borzo, Marie, Rafalko, Joseph J., Dammel, Ralph R., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 258 KB

english, 1994

34

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Evaluation of a new environmentally stable positive tone chemically amplified deep-UV resist

Huang, Wu-Song, Kwong, Ranee W., Katnani, Ahmad D., Khojasteh, Mahmoud, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 1.22 MB

english, 1994

35

SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Novel Photooxidative Scheme for Imaging at Polymer Surfaces

Nalamasu, Omkaram, Taylor, Gary N., Reichmanis, Elsa

Year:

1989

Language:

english

File:

PDF, 15.58 MB

english, 1989

36

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Process window analysis of the ARC and TAR systems for quarter-micron optical lithography

Yoshino, Hiroshi, Ohfuji, Takeshi, Aizaki, Naoaki, Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 420 KB

english, 1994

37

SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Comparison of photoresist shelf life in PGMEA and CA solvent systems

Nelson, William C., Nalamasu, Omkaram

Year:

1994

Language:

english

File:

PDF, 185 KB

english, 1994

38

The Synthesis, Characterization and Lithography of Photo-Acid Generators with Improved Thermal Stability.

Houlihan, F. M., Chin, E., Nalamasu, O., Kometani, J. M., Neenan, T.X., Pangborn, A.

Journal:

Journal of Photopolymer Science and Technology

Year:

1993

Language:

english

File:

PDF, 443 KB

english, 1993

39

An overview of resist processing for deep-UV lithography.

NALAMASU, OMKARAM, CHENG, MAY, TIMKO, ALLEN G., POL, VICTOR, REICHMANIS, ELSA, THOMPSON, LARRY F.

Journal:

Journal of Photopolymer Science and Technology

Year:

1991

Language:

english

File:

PDF, 830 KB

english, 1991

40

[ACS Symposium Series] Micro- and Nanopatterning Polymers Volume 706 || Alkali-Developable Positive-Photosensitive Polyimide Based on Diazonaphthoquinone Sensitizer

Ito, Hiroshi, Reichmanis, Elsa, Nalamasu, Omkaram, Ueno, Takumi

Year:

1998

Language:

english

File:

PDF, 709 KB

english, 1998

41

Methodological application of quantile mapping to generate precipitation data over Northwest Himalaya

Devi, Usha, Shekhar, Manorama S., Singh, Gyan P., Rao, Nalamasu N., Bhatt, Uma S.

Journal:

International Journal of Climatology

Year:

2019

Language:

english

File:

PDF, 12.64 MB

english, 2019

42

Potential Neurological Manifestations of COVID-19: A Narrative Review

Pergolizzi, Joseph V., Raffa, Robert B., Varrassi, Giustino, Magnusson, Peter, LeQuang, Jo Ann, Paladini, Antonella, Taylor, Robert, Wollmuth, Charles, Breve, Frank, Chopra, Maninder, Nalamasu, Rohit,

Journal:

Postgraduate Medicine

Year:

2020

File:

PDF, 814 KB

2020

43

Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

Reichmanis, Elsa, Nalamasu, Omkaram, Houlihan, Francis M, Novembre, Anthony E

Journal:

Polymer International

Year:

1999

Language:

english

File:

PDF, 364 KB

english, 1999

44

Directed Growth and Electrical- Transport Properties of Carbon Nanotube Architectures on Indium Tin Oxide Films on Silicon-Based Substrates

S. Agrawal, M. J. Frederick, F. Lupo, P. Victor, O. Nalamasu, G. Ramanath

Journal:

Advanced Functional Materials

Year:

2005

Language:

english

File:

PDF, 393 KB

english, 2005

45

ChemInform Abstract: Organic Materials Challenges for 193 nm Imaging

Elsa Reichmanis, Omkaram Nalamasu, Frank M. Houlihan

Journal:

Year:

1999

File:

PDF, 24 KB

1999

46

Materials and processes for imaging at the resolution limits of optical lithography

Gary N. Taylor, Omkaran Nalamasu, Larry E. Stillwagon

Journal:

Microelectronic Engineering

Year:

1989

Language:

english

File:

PDF, 3.63 MB

english, 1989

47

Lithographic properties of chemically amplified resists based on copolymers of 4-tert-butoxycarbonyloxystyrene (TBS) and sulfur dioxide (SO2)

A.E. Novembre, J.E. Hanson, J.M. Kometani, W.W. Tai, O. Nalamasu, G.N. Taylor, E. Reichmanis, L.F. Thompson, D.N. Tomes

Journal:

Microelectronic Engineering

Year:

1992

Language:

english

File:

PDF, 280 KB

english, 1992

48

Identification of sensitive positive and negative working resist materials for proximity X-ray lithography

A.E. Novembre, J.M. Kometani, C.S. Knurek, U. Kumar, T.X. Neenan, D.A. Mixon, O. Nalamasu, N. Mu¨nzel

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 530 KB

english, 1995

49

Lithographic and pattern transfer of a novel deep-UV photoresist: ARCH2

P. Falcigno, N. Münzel, H. Holzwarth, H.-T. Schacht, C. Mertesdorf, W. Bronner, G. Kaufel, A. Timko, O. Nalamasu

Journal:

Microelectronic Engineering

Year:

1996

Language:

english

File:

PDF, 1.49 MB

english, 1996

50

Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators

F.M. Houlihan, O. Nalamasu, E. Reichmanis

Journal:

Journal of Fluorine Chemistry

Year:

2003

Language:

english

File:

PDF, 232 KB

english, 2003